Chemistry of Materials
DOI: 10.1021/cm504089r
Saiful M. Islam, S. Vanishri, Hao Li, Constantinos C. Stoumpos, John. A. Peters, Maria Sebastian, Zhifu Liu, Shichao Wang, Alyssa S. Haynes, Jino Im, Arthur J. Freeman, Bruce Wessels and Mercouri G. Kanatzidis
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