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Tuesday, June 02, 2015
Moiré Nanosphere Lithography
ACS Nano
DOI: 10.1021/acsnano.5b00978
Kai Chen, Bharath Bangalore Rajeeva, Zilong Wu, Michael Rukavina, Thang Duy Dao, Satoshi Ishii, Masakazu Aono, Tadaaki Nagao and Yuebing Zheng
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