Thursday, August 27, 2015

Nanoimprint-Assisted Shear Exfoliation (NASE) for Producing Multilayer MoS2 Structures as Field-Effect Transistor Channel Arrays

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ACS Nano
DOI: 10.1021/acsnano.5b01715

Mikai Chen, Hongsuk Nam, Hossein Rokni, Sungjin Wi, Jeong Seop Yoon, Pengyu Chen, Katsuo Kurabayashi, Wei Lu and Xiaogan Liang
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