Nanoscale, 2015, Accepted Manuscript
DOI: 10.1039/C5NR05645D, Paper
DOI: 10.1039/C5NR05645D, Paper
Zilong Wu, Kai Chen, Ryan Menz, Tadaaki NAGAO, Yuebing Zheng
Moire nanosphere lithography (MNSL), which features the relative in-plane rotation between two layers of self-assembled monodisperse nanospheres as masks, provides a cost-effective approach for creating moire patterns on general substrates....
The content of this RSS Feed (c) The Royal Society of Chemistry
Moire nanosphere lithography (MNSL), which features the relative in-plane rotation between two layers of self-assembled monodisperse nanospheres as masks, provides a cost-effective approach for creating moire patterns on general substrates....
The content of this RSS Feed (c) The Royal Society of Chemistry
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