Tuesday, November 10, 2015

Protocol for High-Sensitivity Surface Area Measurements of Nanostructured Films Enabled by Atomic Layer Deposition of TiO2

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.5b07458

Stephen M. Ubnoske, Qing Peng, Eric R. Meshot, Charles B. Parker and Jeffrey T. Glass
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