Fabrication of ultra-dense sub-10 nm in-plane Si nanowire arrays from a novel block copolymer method: optical properties

Nanoscale, 2015, Accepted Manuscript
DOI: 10.1039/C5NR07085F, Paper

Tandra Ghoshal, Christos Ntaras, John O'Connell, Matthew Shaw, Justin D. Holmes, Apostolos Avgeropoulos, M A Morris
In an effort we have used low-[small chi], symmetric block copolymer as an alternative to the high-[small chi] systems currently being translated towards industrial silicon chip manufacture. Here, methodology for generating on-chip,...
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