Nanoscale, 2016, Advance Article
DOI: 10.1039/C5NR07334K, Communication
DOI: 10.1039/C5NR07334K, Communication
Li Li, Souvik Chakrabarty, Jing Jiang, Ben Zhang, Christopher Ober, Emmanuel P. Giannelis
The solubility behavior of Hf and Zr based hybrid nanoparticles with different surface ligands in different concentrations of photoacid generator as potential EUV photoresists was investigated in detail.
To cite this article before page numbers are assigned, use the DOI form of citation above.
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The solubility behavior of Hf and Zr based hybrid nanoparticles with different surface ligands in different concentrations of photoacid generator as potential EUV photoresists was investigated in detail.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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