Friday, December 28, 2012

Structural Characterization of a Manganese Oxide Barrier Layer Formed by Chemical Vapor Deposition for Advanced Interconnects Application on SiOC Dielectric Substrates

Nguyen Mai Phuong, Yuji Sutou and Junichi Koike



TOC Graphic


The Journal of Physical Chemistry C

DOI: 10.1021/jp303241c






Link to full article
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