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Z. Yao, Y.-W. Lu, and S. G. Kandlikar
Uniform silicon nanowires (SiNW) were successfully fabricated on the top, bottom, and sidewall surfaces of silicon microchannels by using a two-step electroless etching process. Different microchannel patterns with the channel width from 100 to 300 [mu]m were first fabricated in a 10 mm x 10 mm si ... [J. Nanotechnol. Eng. Med. 3, 031002 (2013)] published Fri Jan 18, 2013.
Link to full article
Z. Yao, Y.-W. Lu, and S. G. Kandlikar
Uniform silicon nanowires (SiNW) were successfully fabricated on the top, bottom, and sidewall surfaces of silicon microchannels by using a two-step electroless etching process. Different microchannel patterns with the channel width from 100 to 300 [mu]m were first fabricated in a 10 mm x 10 mm si ... [J. Nanotechnol. Eng. Med. 3, 031002 (2013)] published Fri Jan 18, 2013.
Link to full article
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