Monday, June 03, 2013

Nucleation and Atomic Layer Reaction in Nickel Silicide for Defect-Engineered Si Nanochannels

Wei Tang, S. Tom Picraux, Jian Yu Huang, Andriy M. Gusak, King-Ning Tu and Shadi A. Dayeh



TOC Graphic


Nano Letters

DOI: 10.1021/nl400949n






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