Nanoscale , 2014, Accepted Manuscript
DOI: 10.1039/C3NR06723H, Paper
DOI: 10.1039/C3NR06723H, Paper
deqiang wang, jingwei bai, Sung-wook Nam, Hongbo Peng, Robert Bruce, Lynn Gignac, Markus Brink, Ernst Kratschmer, Stephen Rossnagel, Philip S. Waggoner, Kathy Reuter, Chao Wang, Yann Astier, Venkat Balagurusamy, Binquan Luan, Young Kwark, Eric Joseph, Michael Guillorn, stas Polonsky, Ajay Royyuru, Satyavolu Papa Rao, Gustavo A Stolovitzky
We introduce a method to fabricate solid-state nanopores at sub-20 nm diameter in membranes with embedded metal electrodes across a 200 mm wafer with CMOS compatible semiconductor processes. Multi-layer (metal-dielectric)...
The content of this RSS Feed (c) The Royal Society of Chemistry
We introduce a method to fabricate solid-state nanopores at sub-20 nm diameter in membranes with embedded metal electrodes across a 200 mm wafer with CMOS compatible semiconductor processes. Multi-layer (metal-dielectric)...
The content of this RSS Feed (c) The Royal Society of Chemistry
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