Heterogeneous nanostructured electrodes using carbon nanosheets (CNS) and TiO 2 exhibit high electronic and ionic conductivity. In order to realize the chip level power sources, it is necessary to employ microelectronic compatible techniques for the fabrication and characterization of TiO 2 -CNS thin-film electrodes. To achieve this, vertically standing CNS grown through a catalytic free approach on a TiN/SiO 2 /Si substrate by plasma enhanced chemical vapour deposition (PECVD) was used. The substrate-attached CNS is responsible for the sufficient electronic conduction and increased surface-to-volume ratio due to its unique morphology. Atomic layer deposition (ALD) of nanostructured amorphous TiO 2 on CNS provides enhanced Li storage capacity, high rate performance and stable cycling. The amount of deposited TiO 2 masks the underlying CNS, thereby controlling the accessibility of CNS, which gets reflected in the total electrochemica...
S Moitzheim, C S Nimisha, Shaoren Deng, Daire J Cott, C Detavernier and P M Vereecken
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S Moitzheim, C S Nimisha, Shaoren Deng, Daire J Cott, C Detavernier and P M Vereecken
Click for full article
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