In Situ IR Spectroscopic Investigation of Alumina ALD on Porous Silica Films: Thermal versus Plasma-Enhanced ALD
The Journal of Physical Chemistry C
DOI: 10.1021/jp5088288
Elisabeth Levrau, Kevin Van de Kerckhove, Kilian Devloo-Casier, Sreeprasanth Pulinthanathu Sree, Johan A. Martens, Christophe Detavernier and Jolien Dendooven
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