Friday, December 07, 2012

Pattern Placement Accuracy in Block Copolymer Directed Self-Assembly Based on Chemical Epitaxy

Gregory S. Doerk, Chi-Chun Liu, Joy Y. Cheng, Charles T. Rettner, Jed W. Pitera, Leslie E. Krupp, Teya Topuria, Noel Arellano and Daniel P. Sanders



TOC Graphic


ACS Nano

DOI: 10.1021/nn303974j






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