David Grosso
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Nanoscale , 2013, Advance Article
DOI: 10.1039/C2NR33341D, Paper
DOI: 10.1039/C2NR33341D, Paper
Marco Faustini, Glenna L. Drisko, Alban A. Letailleur, Rafael Salas Montiel, Cedric Boissiere, Andrea Cattoni, Anne Marie Haghiri-Gosnet, Gilles Lerondel, David Grosso
Novel sol-gel derived reactive nanomasks were used for dry etching of silicon allowing the formation of nanowells or nanopillars.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
Novel sol-gel derived reactive nanomasks were used for dry etching of silicon allowing the formation of nanowells or nanopillars.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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