Friday, May 16, 2014

Fabrication of sub-20 nm nano-gap structures through the elastomeric nano-stamp assisted secondary sputtering phenomenon




Nanoscale , 2014, 6,5953-5959

DOI: 10.1039/C3NR06346A, Paper

Hwan-Jin Jeon, Eun Hyung Lee, Hae-Wook Yoo, Kyoung Hwan Kim, Hee-Tae Jung

We describe a highly efficient method for fabricating controllable and reliable sub-20 nm scale nano-gap structures through an elastomeric nano-stamp with an embedded ultra-thin pattern.

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