Thursday, March 26, 2015

Defect/oxygen assisted direct write technique for nanopatterning graphene




Nanoscale , 2015, 7,6271-6277

DOI: 10.1039/C4NR07585D, Paper

Alberto Cagliani, Niclas Lindvall, Martin Benjamin Barbour Spanget Larsen, David M. A. Mackenzie, Bjarke Sorensen Jessen, Timothy J. Booth, Peter Boggild

We present a novel direct write technique to etch sub-40 nm features into graphene by selectively etching damaged graphene areas.

The content of this RSS Feed (c) The Royal Society of Chemistry





Click for full article

No comments:

Post a Comment