Monday, January 04, 2016

Doping silicon nanocrystals and quantum dots

Nanoscale, 2016, Advance Article
DOI: 10.1039/C5NR04978D, Review Article
Brittany L. Oliva-Chatelain, Thomas M. Ticich, Andrew R. Barron
The methods and characterization of dopants into silicon nanocrystals and quantum dots is reviewed, with emphasis on the location of the doping element: within the crystal lattice (c-doping), on the surface (s-doping), or within the surrounding matrix (m-doping).
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