Tuesday, January 05, 2016

Fabrication of ultra-dense sub-10 nm in-plane Si nanowire arrays by using a novel block copolymer method: optical properties

Nanoscale, 2016, Advance Article
DOI: 10.1039/C5NR07085F, Paper
Tandra Ghoshal, Christos Ntaras, John O'Connell, Matthew T. Shaw, Justin D. Holmes, Apostolos Avgeropoulos, Michael A. Morris
The use of a low-[small chi], symmetric block copolymer as an alternative to the high-[small chi] systems currently being translated towards industrial silicon chip manufacture has been demonstrated.
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