Atomic Layer Deposition of Al2O3 onto Sn-Doped In2O3: Absence of Self-Limited Adsorption during Initial Growth by Oxygen Diffusion from the Substrate and Band Offset Modification by Fermi Level Pinning in Al2O3
Thorsten J.M. Bayer, André Wachau, Anne Fuchs, Jonas Deuermeier and Andreas Klein
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