Thursday, November 29, 2012

Cyclic Block Copolymers for Controlling Feature Sizes in Block Copolymer Lithography

Justin E. Poelma, Kosuke Ono, Daigo Miyajima, Takuzo Aida, Kotaro Satoh and Craig J. Hawker



TOC Graphic


ACS Nano

DOI: 10.1021/nn304217y






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