Saturday, December 22, 2012

FluidFM as a lithography tool in liquid: spatially controlled deposition of fluorescent nanoparticles

Tomaso Zambelli






Nanoscale , 2013, Advance Article

DOI: 10.1039/C2NR33214K, Paper

Raphael R. Gruter, Janos Voros, Tomaso Zambelli

The mechanism of AFM-based pattern formation via dispensing in liquid was elucidated by investigating the effect of applied pressure, tip velocity and force setpoint.

To cite this article before page numbers are assigned, use the DOI form of citation above.

The content of this RSS Feed (c) The Royal Society of Chemistry





Link to full article

No comments:

Post a Comment