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Monday, July 01, 2013
Defect Suppression in AlN Epilayer Using Hierarchical Growth Units
The Journal of Physical Chemistry C
DOI: 10.1021/jp401745v
Qinqin Zhuang, Wei Lin, Weihuang Yang, Wencao Yang, ChengCheng Huang, Jinchai Li, HangYang Chen, Shuping Li and Junyong Kang
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