Double oxide deposition and etching nanolithography for wafer-scale nanopatterning with high-aspect-ratio using photolithography

Jungho Seo, Hanchul Cho, and Ju-kyung Lee et al.

We report a nanolithography technique for the high aspect-ratio nanostructure manufacturing using DODE (double oxide deposition and etching) process. Conventional microfabrication processes are integrated to manufacture nanostructure arrays with sub-100 nm of linewidth. This lithography method is ... [Appl. Phys. Lett. 103, 033105 (2013)] published Tue Jul 16, 2013.



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