Wednesday, July 10, 2013

Highly Selective Dry Etching of Germanium over Germanium–Tin (Ge1–xSnx): A Novel Route for Ge1–xSnx Nanostructure Fabrication

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DOI: 10.1021/nl4017286




Suyog Gupta, Robert Chen, Yi-Chiau Huang, Yihwan Kim, Errol Sanchez, James S. Harris and Krishna C. Saraswat

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