The improved resistive switching (RS) performance characteristics of nickel nitride (NiN) films-based crossbar array (CBA) memory resistors—such as reduction in the operating voltages, reset current and current/voltage variations; no initial forming process; and set/reset speeds—are demonstrated using nanopyramid-patterned (NPP) platinum-bottom electrodes. Compared with a conventional CBA sample with flat-bottom electrodes, both the voltage and the current of the set and reset operations are respectively reduced when NPP samples are used. The drastic reduction in the variation of the operating voltage and current is of particular interest. We explain the RS process using the model of the redox-reaction-mediated formation and rupture of the conducting filaments in the NiN films, based on the capacitance–voltage and conductance–voltage characteristics under different resistance states.
Hee-Dong Kim, Min Ju Yun, Seok Man Hong and Tae Geun Kim
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Hee-Dong Kim, Min Ju Yun, Seok Man Hong and Tae Geun Kim
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