Tuesday, March 19, 2013

Resolution Limits of Electron-Beam Lithography toward the Atomic Scale

Vitor R. Manfrinato, Lihua Zhang, Dong Su, Huigao Duan, Richard G. Hobbs, Eric A. Stach and Karl K. Berggren



TOC Graphic


Nano Letters

DOI: 10.1021/nl304715p






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