Surface Chemistry and Interface Formation during the Atomic Layer Deposition of Alumina from Trimethylaluminum and Water on Indium Phosphide

Christoph Adelmann, Daniel Cuypers, Massimo Tallarida, Leonard N. J. Rodriguez, Astrid De Clercq, Daniel Friedrich, Thierry Conard, Annelies Delabie, Jin Won Seo, Jean-Pierre Locquet, Stefan De Gendt, Dieter Schmeisser, Sven Van Elshocht and Matty Caymax

Chemistry of Materials

DOI: 10.1021/cm304070h

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