Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2 + NO → F + FNO at an Elevated Temperature
The Journal of Physical Chemistry C
DOI: 10.1021/jp4084794
Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine and Masaru Hori
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