Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function
Nano Letters
DOI: 10.1021/nl5013773
Vitor R. Manfrinato, Jianguo Wen, Lihua Zhang, Yujia Yang, Richard G. Hobbs, Bowen Baker, Dong Su, Dmitri Zakharov, Nestor J. Zaluzec, Dean J. Miller, Eric A. Stach and Karl K. Berggren
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