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Friday, June 27, 2014
Photoassisted Immersion Deposition of Cu Clusters onto Porous Silicon: A Langmuir–Hill Ligand–Locus Model Applied to the Growth Kinetics
The Journal of Physical Chemistry C
DOI: 10.1021/jp502108b
Gonzalo Recio, Dario Gallach, Miguel Manso Silván, Kazuhiro Fukami, Raúl José Martín Palma, Germán Rafael Castro and Álvaro Muñoz-Noval
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