Combining the self-organized growth of nanometer size islands with the use of a pre-patterned substrate, the fabrication of a metallic nanoparticle array with sub-100 nm period is demonstrated. The array pattern is artificially defined through conventional lithography on a Si substrate. Two passiv ... [Appl. Phys. Lett. 103, 123117 (2013)] published Fri Sep 20, 2013.
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