Monday, June 02, 2014

Graphene as an atomically thin barrier to Cu diffusion into Si




Nanoscale , 2014, Advance Article

DOI: 10.1039/C3NR06771H, Paper

Juree Hong, Sanggeun Lee, Seulah Lee, Heetak Han, Chandreswar Mahata, Han-Wool Yeon, Bonwoong Koo, Seong-Il Kim, Taewook Nam, Kisik Byun, Byung-Wook Min, Young-Woon Kim, Hyungjun Kim, Young-Chang Joo, Taeyoon Lee

We investigate the ability of both single-layer and multilayer graphene grown by chemical vapor deposition (CVD) to act as Cu diffusion barriers.

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