Nanoscale , 2013, Accepted Manuscript
DOI: 10.1039/C3NR02086J, Paper
DOI: 10.1039/C3NR02086J, Paper
Guoyong Fang, Jing Ma
Rapid atomic layer deposition (RALD) has been applied to prepare various nanolaminates with the multilayer repeated structures. The possible reaction pathways for RALD of the Al2O3/SiO2 nanolaminate using trimethylaluminum (TMA)...
The content of this RSS Feed (c) The Royal Society of Chemistry
Rapid atomic layer deposition (RALD) has been applied to prepare various nanolaminates with the multilayer repeated structures. The possible reaction pathways for RALD of the Al2O3/SiO2 nanolaminate using trimethylaluminum (TMA)...
The content of this RSS Feed (c) The Royal Society of Chemistry
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