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Wednesday, May 29, 2013
Crystal Growth and Real Structure Effects of the First Weak 3D Stacked Topological Insulator Bi14Rh3I9
Bertold Rasche, Anna Isaeva, Alexander Gerisch, Martin Kaiser, Wouter Van den Broek, Christoph T. Koch, Ute Kaiser and Michael Ruck
Chemistry of Materials
DOI: 10.1021/cm4010823
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