Wednesday, May 29, 2013

Surface Interrogation Scanning Electrochemical Microscopy (SI-SECM) of Photoelectrochemistry at a W/Mo-BiVO4 Semiconductor Electrode: Quantification of Hydroxyl Radicals during Water Oxidation

Hyun S. Park, Kevin C. Leonard and Allen J. Bard



TOC Graphic


The Journal of Physical Chemistry C

DOI: 10.1021/jp400478z






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