Chemistry of Materials
DOI: 10.1021/cm4020942
Robert D. Kennedy, Vaiva Krungleviciute, Daniel J. Clingerman, Joseph E. Mondloch, Yang Peng, Christopher E. Wilmer, Amy A. Sarjeant, Randall Q. Snurr, Joseph T. Hupp, Taner Yildirim, Omar K. Farha and Chad A. Mirkin
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