Tuesday, August 20, 2013

Origin of the self-limited electron densities at Al2O3/SrTiO3 heterostructures grown by atomic layer deposition - oxygen diffusion model




Nanoscale , 2013, Advance Article

DOI: 10.1039/C3NR03082B, Communication

Sang Woon Lee, Jaeyeong Heo, Roy G. Gordon

The saturated electron density at the Al2 O3 /SrTiO3 heterostructures above the critical thickness of Al2 O3 is explained by an oxygen diffusion mechanism.

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