Thursday, August 08, 2013

Suppressed Thermally Activated Carrier Transport in Atomically Thin MoS2 on Crystalline Hexagonal Boron Nitride Substrates

Nanoscale , 2013, Accepted Manuscript

DOI: 10.1039/C3NR03220E, Communication

Mei Yin Chan, Katsuyoshi Komatsu, Songlin Li, Yong Xu, Peter Darmawan, Hiromi Kuramochi, Nakaharai Shu, Alex Aparecido Ferreira, Kenji Watanabe, Takashi Taniguchi, Kazuhito Tsukagoshi

The carrier mobility of the atomically thin MoS2 field-effect transistors shows a suppression of thermally activated transport on h-BN substrates.

The content of this RSS Feed (c) The Royal Society of Chemistry





Click for full article

No comments:

Post a Comment