Thursday, August 01, 2013

Swift Nanopattern Formation of PS-b-PMMA and PS-b-PDMS Block Copolymer Films Using a Microwave Assisted Technique

TOC Graphic


ACS Nano

DOI: 10.1021/nn4035519




Dipu Borah, Ramsankar Senthamaraikannan, Sozaraj Rasappa, Barbara Kosmala, Justin D Holmes and Michael A Morris

Click for full article
Posted by at
Labels: ,

No comments:

Post a Comment

Subscribe to: Post Comments (Atom)