Friday, August 23, 2013

Thermal Probe Maskless Lithography for 27.5 nm Half-Pitch Si Technology

TOC Graphic


Nano Letters

DOI: 10.1021/nl4024066




Lin Lee Cheong, Philip Paul, Felix Holzner, Michel Despont, Daniel J. Coady, James L. Hedrick, Robert Allen, Armin W. Knoll and Urs Duerig

Click for full article
Posted by at
Labels: ,

No comments:

Post a Comment

Subscribe to: Post Comments (Atom)