Tuesday, May 21, 2013

Direct Imaging of 3D Atomic-Scale Dopant-Defect Clustering Processes in Ion-Implanted Silicon

S. Koelling, O. Richard, H. Bender, M. Uematsu, A. Schulze, G. Zschaetzsch, M. Gilbert and W. Vandervorst



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Nano Letters

DOI: 10.1021/nl400447d






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