Wednesday, May 01, 2013

Reaching the Theoretical Resonance Quality Factor Limit in Coaxial Plasmonic Nanoresonators Fabricated by Helium Ion Lithography

M. Melli, A. Polyakov, D. Gargas, C. Huynh, L. Scipioni, W. Bao, D. F. Ogletree, P. J. Schuck, S. Cabrini and A. Weber-Bargioni



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Nano Letters

DOI: 10.1021/nl400844a






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